Presentation Title
Fabricating High-Quality Ultra-Thin Croconic Acid Film Using Electric Field Guidance
Presentation Type
Oral Presentation
College
College of Natural Sciences
Major
Chemistry and Biochemistry
Session Number
2
Location
RM 215
Juror Names
Moderator: Dr. Kimberly Cousins
Start Date
5-18-2017 3:50 PM
End Date
5-18-2017 4:10 PM
Abstract
A novel method for fabricating ultrathin croconic acid (CA) films with a very low surface roughness on Si wafers is reported. With a thickness of approximately 20 nm and surface roughness of 2.0 nm, the film obtained far exceeds the quality and smoothness of previously reported CA thin films. The film is prepared by utilizing a high electric field applied in situ during thermal vapor deposition by promoting the alignment of the CA molecules due to their high dipole moment. The resulting film is compared with that of the best-reported film produced via a combination of thermal evaporation at low substrate temperature with subsequent slow heating, to demonstrate the greatly enhanced uniformness of the film, producing a film with ferroelectric properties. A mechanism for film formation under electric field assisted deposition is proposed.
Fabricating High-Quality Ultra-Thin Croconic Acid Film Using Electric Field Guidance
RM 215
A novel method for fabricating ultrathin croconic acid (CA) films with a very low surface roughness on Si wafers is reported. With a thickness of approximately 20 nm and surface roughness of 2.0 nm, the film obtained far exceeds the quality and smoothness of previously reported CA thin films. The film is prepared by utilizing a high electric field applied in situ during thermal vapor deposition by promoting the alignment of the CA molecules due to their high dipole moment. The resulting film is compared with that of the best-reported film produced via a combination of thermal evaporation at low substrate temperature with subsequent slow heating, to demonstrate the greatly enhanced uniformness of the film, producing a film with ferroelectric properties. A mechanism for film formation under electric field assisted deposition is proposed.
